Multi-Target Sputtering Holders / Assemblies For Sputtering Deposition Systems

 

Our experience of varied sputtering target assembly builds for the demanding high plasma power environment that can be provided by PQL’s HiTUS high density plasma source allows us to offer robust and proven effective sputtering target assemblies, single or multiple, in a variety of configurations and options.

 

HiTUS Diode or Magnetron Target Holders

We offer planar ‘disc’ target holder units for both remote plasma sourced use and magnetron configuration: the mode to be used can be swapped if desired, requiring only simple engineering change.

 

Up to 6” diameter / diagonal standard planar sputtering targets

A range of target sizes and shapes can usually be accommodated, allowing use of existing customer stock or “standard” sizes from other systems: additional target carrier / target backing plates, inserts or adaptors can be supplied to provide maximum flexibility of use.

 

High Power Capability

Our target stages are designed for up to 1000V (DC or pDC) as standard. Our designs are proven for operating powers of up to 50W/cm2 (full target surface sputtering with HiTUS): i.e. about 3.25kW for a 4” diameter ‘standard’ disc sputter target.

 

Targets are water cooled as standard and other elements of the assembly – notably the target dark shields – can be water cooled where a low radiant heat flux to substrates is desired.

 

Controllably indexable multiple target assemblies

We offer developed and proven multi-target designs, typically for 2 to 6 targets, both conventional static units and our preferred rotary carousel designs. Rotary carousel designs include suitable shuttering or cover plates to permit each target to be indexed to the same sputtering position. A key benefit of this is that targets operate from an identical position, simplifying uniformity set up for multi-layer structures; inactive targets are shielded from contamination from the active target at all times.

 

For remote plasma sourced diode sputtering use (only), a single large diameter multi-sputtering target ‘holder’ can be used, rotating the required target to a required ‘plasma aperture’: this significantly reduces cost and complexity of the unit: this is the standard PQL HiTUS configuration and is a proven design with over 20 years use.

 

Software controllable target indexing

Rotary carousel designs usually include software control of indexing: this can be a simple stand alone control unit or control integrated into overall system control: target selection may also be included in recipe driven processes where this is used. Manual indexing is also available.

 

Single power supply

Rotary multi-target units can use a single target power supply: switching is integral to the assembly. Where needed, we can design systems to switch between two differing power supplies, either through a user configurable hardware rotary selector integrated to the target assembly, or through software controlled switching. This allows use of target sputter materials combinations – e.g. metals and ceramic – that ideally require differing power supply mode (i.e. pDC for metals, RF for ceramics).

 

Co-sputtering Designs

We have a variety of schemes available and proven in use for co-sputtering from our rotary target units and will be happy to further discuss an optimum solution for your need.

 

We can also provide more usual static (non-rotary) “target clusters” where this is a preferred solution.